4.8 Article

Lessons from hafnium dioxide-based ferroelectrics

期刊

NATURE MATERIALS
卷 22, 期 5, 页码 562-569

出版社

NATURE PORTFOLIO
DOI: 10.1038/s41563-023-01507-2

关键词

-

向作者/读者索取更多资源

More than ten years after the first report of ferroelectric switching in hafnium dioxide-based ultrathin layers, the nature of this phenomenon is still under debate, but it has sparked significant interest due to its potential for integration into semiconductor chips and scalability to smaller devices. Lessons learned from hafnium dioxide-based ferroelectrics offer promising avenues beyond random-access memories and field-effect transistors, and further research can lead to discoveries that address current issues and pave the way for low-power electronics and energy-efficient information processing.
A bit more than a decade after the first report of ferroelectric switching in hafnium dioxide-based ultrathin layers, this family of materials continues to elicit interest. There is ample consensus that the observed switching does not obey the same mechanisms present in most other ferroelectrics, but its exact nature is still under debate. Next to this fundamental relevance, a large research effort is dedicated to optimizing the use of this extraordinary material, which already shows direct integrability in current semiconductor chips and potential for scalability to the smallest node architectures, in smaller and more reliable devices. Here we present a perspective on how, despite our incomplete understanding and remaining device endurance issues, the lessons learned from hafnium dioxide-based ferroelectrics offer interesting avenues beyond ferroelectric random-access memories and field-effect transistors. We hope that research along these other directions will stimulate discoveries that, in turn, will mitigate some of the current issues. Extending the scope of available systems will eventually enable the way to low-power electronics, self-powered devices and energy-efficient information processing. The discovery of ferroelectric switching in ultrathin layers of hafnium dioxide has aroused significant interest for low-power non-volatile memory technologies. This Perspective discusses how lessons learned from hafnium dioxide-based ferroelectrics can be applied to other applications, and other binary oxides.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.8
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据