A modified CVD method for the synthesis of monolayer MoS2 and photoelectric improvement by HfO2 passivation

Molybdenum disulfide (MoS2) is an emerging class of new materials with a wide range of potential practical applications. However, the uncontrollability of monolayer MoS2 synthesized by traditional chemical vapor deposition method and the low responsivity of MoS2 photodetectors limit its further development in the field of photoelectric detection. To achieve controlled growth of monolayer MoS2 and construct MoS2 photodetectors with a high responsivity, we propose a novel single crystal growth strategy of high-quality MoS2 by controlling the Mo to S vapor ratio near the substrate, and deposit a layer of hafnium oxide (HfO2) on the surface of MoS2 to enhance the performance of the pristine metal-semiconductor-metal structure photodetector. At a reverse bias of 8 V, the HfO2 passivated MoS2 photodetector features an extremely high responsivity of 1201 AW(-1), a response time of around 0.5 s, and a detectivity of 7.7 x 10(11) Jones. Meanwhile, we deeply investigate the effect of the HfO2 layer on the performance of the fabricated MoS2 photodetector and propose a physical mechanism to interpret the obtained experiment results. These results might facilitate a better understanding on the performance modulation of the MoS2 photodetectors and accelerate the development of MoS2-based optoelectronic devices.

Automated summary

We propose a novel single crystal growth strategy for high-quality MoS2 and enhance the performance of the metal-semiconductor-metal structure photodetector by depositing a layer of HfO2 on the surface of MoS2.