4.6 Article

Vertical strain engineering of Van der Waals heterostructures

期刊

NANOTECHNOLOGY
卷 34, 期 28, 页码 -

出版社

IOP Publishing Ltd
DOI: 10.1088/1361-6528/acc9cb

关键词

2D materials; Van der Waals heterostructures; vertical strain engineering; Schottky barriers; interfacial coupling; electronic structures

向作者/读者索取更多资源

In this work, a novel vertical strain engineering approach is proposed to modify the band structures and electronic coupling of 2D materials in heterostructures. This has significant implications for improving electronic transport and energy conversion efficiency in nanoelectronics.
Van der Waals materials and their interfaces play critical roles in defining electrical contacts for nanoelectronics and developing vehicles for mechanoelectrical energy conversion. In this work, we propose a vertical strain engineering approach by enforcing pressure across the heterostructures. First-principles calculations show that the in-plane band structures of 2D materials such as graphene, h-BN, and MoS2 as well as the electronic coupling at their contacts can be significantly modified. For the graphene/h-BN contact, a band gap in graphene is opened, while at the graphene/MoS2 interface, the band gap of MoS2 and the Schottky barrier height at contact diminish. Changes and transitions in the nature of contacts are attributed to localized orbital coupling and analyzed through the redistribution of charge densities, the crystal orbital Hamilton population, and electron localization, which yield consistent measures. These findings offer key insights into the understanding of interfacial interaction between 2D materials as well as the efficiency of electronic transport and energy conversion processes.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.6
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据