4.7 Article

Physical vapor deposition and thermally induced faceting of tungsten nanoparticles

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MATERIALS CHARACTERIZATION
卷 198, 期 -, 页码 -

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ELSEVIER SCIENCE INC
DOI: 10.1016/j.matchar.2023.112724

关键词

Tungsten; Nanoparticles; Physical vapor deposition; Characterization; Annealing; Faceting

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Nanoscale particles of tungsten were produced using physical vapor deposition and deposited on sapphire substrates. The annealed tungsten particles were found to have a nonuniform island-like structure and transformed into highly faceted nanoparticles after pre-heating at an intermediate temperature followed by annealing at 1100 degrees Celsius under a pressure of 10-7 Torr.
Nanoscale tungsten particles have attracted an increasing level of interest recently. In the current study, tungsten nanoparticles were fabricated utilizing physical vapor deposition and deposited on sapphire (alpha-Al2O3) substrates. The particles generated using this procedure were found to form a network with a continuous nanoporous structure. To study the influence of temperature and pressure on the stability and morphology of tungsten nanoparticles, a multitude of varying pre-heating steps were applied to these nanoscale tungsten particles in a vacuum chamber. The morphology and structure of the annealed tungsten particles were investigated by a series of materials characterization techniques including scanning electron microscopy, X-ray energy dispersive spectroscopy and X-ray photoelectron spectroscopy. The tungsten nanoparticles grew into nonuniform islands when annealed directly at 1100 degrees C, under a pressure of 10-7 Torr. Conversely, the deposited tungsten network transformed into individual, highly faceted nanoparticles when first pre-heated at an intermediate temperature, followed by annealing at 1100 degrees C, under a pressure of 10-7 Torr. Wulff analysis indicated that these welldeveloped tungsten particles exhibit {110} crystallographic facets.

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