4.8 Article

Rapid and Versatile Photonic Annealing of Graphene Inks for Flexible Printed Electronics

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ADVANCED MATERIALS
卷 27, 期 42, 页码 6683-+

出版社

WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.201502866

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资金

  1. Office of Naval Research MURI Program [N00014-11-1-0690]
  2. Northwestern University Materials Research Science and Engineering Center (NSF) [DMR-1121262]
  3. Department of Defense (DoD) through the National Defense Science and Engineering Graduate (NDSEG) Fellowship Program
  4. Ryan Fellowship
  5. NSF MRSEC Program of the Materials Research Center at Northwestern University [DMR-1121262]

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Intense pulsed light (IPL) annealing of graphene inks is demonstrated for rapid post-processing of inkjet-printed patterns on various substrates. A conductivity of approximate to 25 000 S m(-1) is achieved following a single printing pass using a concentrated ink containing 20 mg mL(-1) graphene, establishing this strategy as a practical and effective approach for the versatile and high-performance integration of graphene in printed and flexible electronics.

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