Surface deformation studies of TiO2 thin films by double exposure laser holographic interferometry

Double exposure laser holographic interferometry is implemented to investigate the surface deformation of an stainless steel (SS) 304 substrate during the deposition of titanium dioxide (TiO2) thin films on it. The TiO2 thin film is synthesized by the potentiostatic mode in the electrodeposition process. The in-situ analysis of the stress on the substrate and the thickness of the deposition is evaluated by non-destructive holographic interferometry. The holography interference fringes are computed and show that the TiO2 film thickness increases with an escalation in deposition time, but the stress on the substrate decreases.

Automated summary

Double exposure laser holographic interferometry is used to investigate the surface deformation of an SS 304 substrate during the deposition of TiO2 thin films. The TiO2 film is synthesized by potentiostatic electrodeposition method. Non-destructive holographic interferometry is employed for in-situ analysis of the stress on the substrate and the thickness of deposition. The computed holographic interference fringes show an increase in TiO2 film thickness with deposition time, but a decrease in stress on the substrate.