4.7 Article

High-temperature oxidation behavior of TaTiCr, Ta4Ti3Cr, Ta2TiCr, and Ta4TiCr3 concentrated refractory alloys

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JOURNAL OF ALLOYS AND COMPOUNDS
卷 941, 期 -, 页码 -

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ELSEVIER SCIENCE SA
DOI: 10.1016/j.jallcom.2023.169000

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High-temperature; Oxidation; Refractory; TaTiCr; Complex oxide

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This study investigates the microstructures and oxidation behavior of TaTiCr, Ta4Ti3Cr, Ta2TiCr, and Ta4TiCr3 concentrated refractory alloys, and reveals the effect of moderate composition changes on oxidation performance. The TaTiCr alloy demonstrates superior oxidation resistance, while Ta4TiCr3 shows moderate resistance, and Ta4Ti3Cr and Ta2TiCr exhibit poor performance. The excellent oxidation performance of TaTiCr can be attributed to the compact, continuous oxide scale, the formation of complex oxides and protective Cr2O3, and the presence of complex internal nitride morphology.
This study reports the unique microstructures and high-temperature oxidation behavior of TaTiCr, Ta4Ti3Cr, Ta2TiCr, and Ta4TiCr3 concentrated refractory alloys and elucidates the effect of moderate composition changes on oxidation performance. All alloys investigated in this study formed bcc solid solution matrices with second phase Laves precipitates (except for Ta4Ti3Cr, being single-phase bcc).The alloys were tested for 24 h at 1200 degrees C, of which: TaTiCr exhibited superior oxidation performance for the duration of the test; Ta4TiCr3 showed moderate oxidation resistance, with both parabolic and linear kinetic regimes; and Ta4Ti3Cr and Ta2TiCr both exhibited poor oxidation performance, with Ta2TiCr being completely oxidized after testing. All alloys formed complex oxides; however, the excellent performance of the TaTiCr alloy can be attributed to the compact, continuous nature of the oxide scale, the combination of complex oxides and protective Cr2O3 formation, and the complex internal nitride morphology, slowing oxygen ingress and re-ducing the depth of internal oxidation.Published by Elsevier B.V. This is an open access article under the CC BY license (http://creative-commons.org/licenses/by/4.0/).

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