4.7 Article

Highly dispersed Fe-decorated Ni nanoparticles prepared by atomic layer deposition for dry reforming of methane

期刊

INTERNATIONAL JOURNAL OF HYDROGEN ENERGY
卷 48, 期 74, 页码 28780-28791

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PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.ijhydene.2023.03.470

关键词

Dry reforming of methane; Fe-decorated structure; Atomic layer deposition; Activity improvement; Carbon resistance

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This study utilized atomic layer deposition (ALD) to uniformly disperse Fe nanoparticles on Ni/Al2O3 catalysts, solving the deposition of carbon on active sites during long-term DRM tests. The addition of trace amounts of Fe (0.3-0.6%) facilitated CH4 dissociation on Ni0, improved low-temperature catalytic activity, moderated carbon species, and accelerated coke oxidation. The catalyst with 0.3% Fe content exhibited almost no activity loss in the 72-hour test at 650℃.
Dry reforming of methane (DRM) is a sustainable chemical process that can simultaneously transform methane and carbon dioxide, which are generally considered greenhouse gases, into syngas with H2/CO ratio close to 1. The deposition of carbon on the active sites during long-period DRM tests will lead to severe deactivation of Ni-based catalysts. Thus, in this work, we proposed a series of uniformly dispersed Fe-decorated Ni/Al2O3 catalysts via atomic layer deposition (ALD) to solve this key issue. Modification with trace amounts of Fe (0.3-0.6%) had multiple effects on facilitating the CH4 dissociation on Ni0, improving the low-temperature catalytic activity, moderating the carbon species and accelerating coke oxidation. The sample denoted as 0.3%Fe/Ni/Al2O3 exhibited almost no activity loss in the 72 h test at 650 & DEG;C. The Fe-decorated Ni/Al2O3 structure achieved a balance between the enhancement of CH4 cracking and the elimination of coke. Furthermore, this advanced ALD approach of preparing uniform secondary metal nanoparticle-decorated catalysts provided guidance to other bimetallic systems, such as Pt/Ni, Mn/Ni, and Cu/Ni.& COPY; 2023 Hydrogen Energy Publications LLC. Published by Elsevier Ltd. All rights reserved.

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