Dual-Junctions Field Effect Transistor Based on MoS2/Te/MoS2

In the applications of low-power device design and large-scale integrated circuit, MOSFETs play an important role but suffer from the doping complexity and short channel effect when the technology node is further shrinking. Thus, it is of great interest to develop new transistor architecture with atomically thin channel materials to meet the demand for high-density integration and lowpower consumption electronics. Here, we develop a dualjunctions field-effect transistor (DJFET) consisting of van der Waals MoS2/Te/MoS2 heterojunctions where the MoS2 on top and bottom serves as dual-gate and the tellurium (Te) in middle is the carrier transport channel. The novel transistor exhibits superior transfer and output characteristics with p-type behavior, high mobility of 270.3 cm(2)V(-1)s(-1) and large transconductance of 16.4 mu S, competing with widely-reported MOSFETs based on 2-D semiconductors. Additionally, the devices can be operated as a self-driven photodetector with a high responsivity of 879.2 mAW(-1) and a specific detectivity of 3.47 x 10(11) Jones. This work proposes a new dual-junctions transistor as a highly desirable candidate for next-generation electronic applications.

Automated summary

In this study, a new dual-junctions field-effect transistor (DJFET) is proposed, which uses a van der Waals heterojunction of two-dimensional materials as the carrier transport channel. This transistor exhibits superior characteristics and can be used for high-density integration and low-power consumption electronics, competing with MOSFETs based on 2-D semiconductors.