4.7 Article

Insights into the effects of Al-ion implantation temperature on material properties of 4H-SiC

相关参考文献

注意:仅列出部分参考文献,下载原文获取全部文献信息。
Article Chemistry, Physical

The structural and electronic properties of Carbon-related point defects on 4H-SiC (0001) surface

Shengsheng Wei et al.

Summary: The structural and electronic properties of carbon-related defects on the 4H-SiC surface were investigated, and their effects on the material were studied. The results showed that interstitial defects caused surface reconstruction, and the formation of C-Si, C-i1, C-i3 and C-i4 was favored under carbon-rich conditions, while V-C was favored under silicon-rich conditions.

APPLIED SURFACE SCIENCE (2022)

Article Engineering, Electrical & Electronic

Analysis of the electrical activation data in thermally annealed implanted Al/4H-SiC systems: A novel approach based on cooperativity

Virginia Boldrini et al.

Summary: This article discusses the dependence of Al substitutional fraction on the annealing temperature in implanted silicon carbide (4H-SiC) from a statistical mechanical perspective. It applies concepts related to the cooperative nature of atomic motion to describe the substitution and the regularization of the crystalline structure during annealing. The article also analyzes the early evolution of the substitutional fraction in implanted systems during annealing.

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING (2022)

Article Engineering, Electrical & Electronic

Phosphorus implantation into 4H-SiC at room and elevated temperature

J. Muting et al.

Summary: Phosphorus implantation is crucial for creating localized n-type doped regions in 4H-SiC, but the actual implantation profiles may deviate from the desired ones, affecting device performance. Experimental results show that implantation dose and temperature have a significant impact on phosphorus implantation profiles, with high sample temperature suppressing channeling effects. Comparisons between simulation tools and experimental profiles were critically analyzed.

SEMICONDUCTOR SCIENCE AND TECHNOLOGY (2021)

Article Physics, Condensed Matter

Optical and surface properties of 3C-SiC thin epitaxial films grown at different temperatures on 4H-SiC substrates

Bingjun Wang et al.

Summary: A series of 3C-SiC films were grown on 4H-SiC substrates under different growth conditions using high-temperature chemical vapor deposition (HT-CVD). The effects of growth temperature (Tg) on the film morphology, optical, and material properties were evaluated through XRD, XPS, and RSS, with significant impacts observed on crystalline quality and surface states. Raman spectroscopy showed a shift in the TO mode frequency with increasing Tg, and temperature-dependent studies revealed anharmonic coupling and phonon lifetime variations, leading to the determination of an optimized Tg.

SUPERLATTICES AND MICROSTRUCTURES (2021)

Article Microscopy

4H-SiC surface morphology after Al ion implantation and annealing with C-cap

Marica Canino et al.

JOURNAL OF MICROSCOPY (2020)

Article Engineering, Electrical & Electronic

Spatially Resolved Diffusion of Aluminum in 4H-SiC During Postimplantation Annealing

Johanna Muting et al.

IEEE TRANSACTIONS ON ELECTRON DEVICES (2020)

Article Engineering, Electrical & Electronic

Ion implantation of aluminum in 4H-SiC epilayers from 90 keV to above 1 MeV

Ling Sang et al.

SOLID-STATE ELECTRONICS (2020)

Article Materials Science, Multidisciplinary

Enhancing oxidation rate of 4H-SiC by oxygen ion implantation

Min Liu et al.

JOURNAL OF MATERIALS SCIENCE (2019)

Article Physics, Applied

Native point defects and carbon clusters in 4H-SiC: A hybrid functional study

Takuma Kobayashi et al.

JOURNAL OF APPLIED PHYSICS (2019)

Article Instruments & Instrumentation

Structural and optical studies of gamma irradiated N-doped 4H-SiC

Indudhar Panduranga Vali et al.

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS (2019)

Article Engineering, Electrical & Electronic

Effect of high temperature annealing (T > 1650 °C) on the morphological and electrical properties of p-type implanted 4H-SiC layers

M. Spera et al.

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING (2019)

Article Chemistry, Physical

Characterization of 167 MeV Xe ion irradiated n-type 4H-SiC

M. J. Madito et al.

APPLIED SURFACE SCIENCE (2019)

Article Materials Science, Multidisciplinary

Raman spectroscopic study of He ion implanted 4H and 6H-SiC

A. Ashraf Ali et al.

MATERIALS LETTERS (2018)

Article Engineering, Electrical & Electronic

Defects related to electrical doping of 4H-SiC by ion implantation

Roberta Nipoti et al.

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING (2018)

Article Materials Science, Multidisciplinary

Temperature and doping dependence of the Raman scattering in 4H-SiC

Yan Peng et al.

OPTICAL MATERIALS EXPRESS (2016)

Article Materials Science, Multidisciplinary

Structural and Functional Characterizations of Al+ Implanted 4H-SiC Layers and Al+ Implanted 4H-SiC p-n Junctions after 1950 degrees C Post Implantation Annealing

Roberta Nipoti et al.

ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY (2016)

Article Physics, Applied

The Electronic Structures and Magnetism in Al Doped 4H-SiC: The First-Principles Calculation

Xue-ling Lin et al.

JOURNAL OF SUPERCONDUCTIVITY AND NOVEL MAGNETISM (2014)

Article Engineering, Electrical & Electronic

High-Dose Phosphorus-Implanted 4H-SiC: Microwave and Conventional Post-Implantation Annealing at Temperatures ≥ 1700°C

R. Nipoti et al.

JOURNAL OF ELECTRONIC MATERIALS (2012)

Proceedings Paper Materials Science, Multidisciplinary

Photoluminescence and Raman spectroscopy characterization of boron- and nitrogen-doped 6H silicon carbide

Yiyu Ou et al.

SILICON CARBIDE AND RELATED MATERIALS 2011, PTS 1 AND 2 (2012)

Article Engineering, Electrical & Electronic

Electrical and Optical Properties of Stacking Faults in 4H-SiC Devices

Bin Chen et al.

JOURNAL OF ELECTRONIC MATERIALS (2010)

Article Chemistry, Multidisciplinary

Covalent attachment of organic monolayers to silicon carbide surfaces

Michel Rosso et al.

LANGMUIR (2008)

Article Instruments & Instrumentation

Ion implantation in 4H-SiC

J. Wong-Leung et al.

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS (2008)

Article Instruments & Instrumentation

High energy N+ ion implantation in 4H-SiC

E. Oliviero et al.

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS (2007)

Article Engineering, Electrical & Electronic

Investigation of oxygen annealing effects on RF sputter deposited SiC thin films

R. M. Todi et al.

SOLID-STATE ELECTRONICS (2006)

Article Crystallography

First principles methods using CASTEP

SJ Clark et al.

ZEITSCHRIFT FUR KRISTALLOGRAPHIE (2005)

Article Physics, Applied

Dislocation loop evolution in ion implanted 4H-SiC

POÅ Persson et al.

JOURNAL OF APPLIED PHYSICS (2003)

Article Physics, Applied

On the nature of ion implantation induced dislocation loops in 4H-silicon carbide

POÅ Persson et al.

JOURNAL OF APPLIED PHYSICS (2002)