期刊
APPLIED PHYSICS EXPRESS
卷 16, 期 5, 页码 -出版社
IOP Publishing Ltd
DOI: 10.35848/1882-0786/acd5a8
关键词
thin film transistors; tunnel contact transistors; source gated transistors; IGZO; display
We present the fabrication and characterization of indium gallium zinc oxide (IGZO) tunneling thin-film transistors. Radio-frequency magnetron sputtering was used to deposit both the IGZO channel and an Al2O3 tunneling barrier layer. Our device showed rapid saturation at a minimal drain bias compared to a conventional device. Moreover, we observed two distinct current saturation mechanisms within a single device, attributed to the competition between the depletion envelope near the source electrode and channel depletion near the drain electrode. This work provides an industry-friendly method for implementing tunnel-contact approach in the display industry.
We report the fabrication and characterization of indium gallium zinc oxide (IGZO) tunneling thin-film transistors. Both the IGZO channel and an Al2O3 tunneling barrier layer were deposited using the radio-frequency magnetron sputtering method. Compared with a conventional device, our device exhibited rapid saturation at a much smaller drain bias. Interestingly, we observed two different current saturation mechanisms within a single device, which can be explained as competition between the depletion envelope near the source electrode and channel depletion near the drain electrode. This work represents an industry-friendly method for implementing the tunnel-contact approach in the display industry.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据