Growth dynamics of selective-area-grown rutile-type SnO2 on TiO2 (110) substrate

We demonstrated selective-area growth of r-SnO2 on a SiO2-masked r-TiO2 (110) substrate. The heteroepitaxy on a window started with a Volmer-Weber mode to grow islands with {100}-, {110}-, and {011}-faceted sidewalls, whose growth shapes were consistent with the rutile structure's equilibrium shape. The islands coalesced each other to make a flat (110) top surface on a striped window, and lateral overgrowth started after the complete coverage of the window. Cross-sectional transmission-electron-microscopy observation of the stripe revealed that misfit dislocations propagated perpendicularly to the facet planes by the image force effect and that the dislocation density reduced substantially in the wing regions.

Automated summary

Selective-area growth of r-SnO2 was achieved on a SiO2-masked r-TiO2 (110) substrate. The heteroepitaxy process led to the growth of islands with {100}-, {110}-, and {011}-faceted sidewalls, which matched the equilibrium shape of the rutile structure. Coalescence of the islands formed a flat (110) top surface on the striped window, followed by lateral overgrowth. Cross-sectional transmission-electron-microscopy observation revealed that misfit dislocations propagated perpendicular to the facet planes due to the image force effect, and the dislocation density decreased significantly in the wing regions.