4.8 Article

Resistive Switching and Current Conduction Mechanisms in Hexagonal Boron Nitride Threshold Memristors with Nickel Electrodes

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ADVANCED FUNCTIONAL MATERIALS
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WILEY-V C H VERLAG GMBH
DOI: 10.1002/adfm.202300428

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2D materials; filaments; hexagonal boron nitride; memristors; threshold switching

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The switching mechanism of multilayer hexagonal boron nitride (h-BN) threshold memristors with nickel (Ni) electrodes is investigated through temperature-dependent current-voltage measurements. The formation and retraction of nickel filaments along boron defects in the h-BN film are proposed as the resistive switching mechanism. The electrical data are corroborated with TEM analyses, confirming the viability of using temperature-dependent current-voltage measurements as a valuable tool for analyzing resistive switching phenomena in memristors made of 2D materials. The memristors exhibit wide current operation range, low standby currents, low cycle-to-cycle variability, and a large On/Off ratio.
The 2D insulating material hexagonal boron nitride (h-BN) has attracted much attention as the active medium in memristive devices due to its favorable physical properties, among others, a wide bandgap that enables a large switching window. Metal filament formation is frequently suggested for h-BN devices as the resistive switching (RS) mechanism, usually supported by highly specialized methods like conductive atomic force microscopy (C-AFM) or transmission electron microscopy (TEM). Here, the switching of multilayer hexagonal boron nitride (h-BN) threshold memristors with two nickel (Ni) electrodes is investigated through their current conduction mechanisms. Both the high and the low resistance states are analyzed through temperature-dependent current-voltage measurements. The formation and retraction of nickel filaments along boron defects in the h-BN film as the resistive switching mechanism is proposed. The electrical data are corroborated with TEM analyses to establish temperature-dependent current-voltage measurements as a valuable tool for the analysis of resistive switching phenomena in memristors made of 2D materials. The memristors exhibit a wide and tunable current operation range and low stand-by currents, in line with the state of the art in h-BN-based threshold switches, a low cycle-to-cycle variability of 5%, and a large On/Off ratio of 10(7).

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