4.8 Article

Direct Bandgap Transition in Many-Layer MoS2 by Plasma-Induced Layer Decoupling

期刊

ADVANCED MATERIALS
卷 27, 期 9, 页码 1573-+

出版社

WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.201405259

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资金

  1. DOE [DE-FG02-07ER46376]
  2. National Science Foundation (NSF) [1124733, 1128304]
  3. MARCO
  4. DARPA
  5. NSE [OCI-1053575]
  6. Information Technology at Purdue University, West Lafayette, IN, USA
  7. Directorate For Engineering [1128304, 1124733] Funding Source: National Science Foundation
  8. Div Of Electrical, Commun & Cyber Sys [1128304, 1124733] Funding Source: National Science Foundation

向作者/读者索取更多资源

An indirect-gap-to-direct-gap transition in many-layer MoS2 is demonstrated. The transition is an outcome of the decoupling of electronic states in individual layers, driven by partial intercalation of the van der Waals gap in MoS2 through exposure to low-power, remotely generated oxygen plasma.

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