4.8 Article

Realization of Room-Temperature Phonon-Limited Carrier Transport in Monolayer MoS2 by Dielectric and Carrier Screening

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ADVANCED MATERIALS
卷 28, 期 3, 页码 547-+

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WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.201503033

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资金

  1. National Key Basic Research Program of China [2013CBA01604, 2015CB921600]
  2. National Natural Science Foundation of China [61325020, 61261160499, 11274154, 61521001]
  3. MICM Laboratory Foundation [9140C140105140C14070]
  4. project funded by Priority Academic Program Development of Jiangsu Higher Education Institutions
  5. Jiangsu Shuangchuang program
  6. Jiangsu Shuangchuang Team Program

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By combining a high-kappa dielectric substrate and a high density of charge carriers, Coulomb impurities in MoS2 can be effectively screened, leading to an unprecedented room- temperature mobility of approximate to 150 cm(2) V-1 s(-1) and room-temperature phonon-limited transport in a mono layer MoS2 transistor for the first time.

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