Defect induced the surface enhanced Raman scattering of MoO3-xthin films by thermal treatment

In this paper, we successfully prepared MoO3_ x films by magnetron sputtering and thermal treatment. The samples annealed at different temperatures were analyzed by atomic force microscopy, scanning electron mi-croscopy, X-ray diffraction, and X-ray photoelectron spectroscopy, respectively. Compared to as-deposited sample, the thermal treatment has the effects of enhancing localized surface plasmon resonance and Raman scattering intensity, improving the uniformity and stability of Raman signals, and reducing the detection limit for dye methylene blue as low as 5 x 10_7 mol/L. In addition, the simulation results of finite-difference-time-domain confirm that the electric field enhancement effect exists in the defect state metal oxide SERS substrate.

Automated summary

In this study, MoO3_x films were prepared by magnetron sputtering and thermal treatment. Analysis of annealed samples showed that thermal treatment enhances localized surface plasmon resonance and Raman scattering intensity, improves the uniformity and stability of Raman signals, and reduces the detection limit for dye methylene blue.