期刊
ELECTRONICS
卷 11, 期 23, 页码 -出版社
MDPI
DOI: 10.3390/electronics11234062
关键词
molecular beam epitaxy; A3B5; semiconductor nanostructures; quantum dots; photoluminescence
资金
- Strategic Academic Leadership Program of the Southern Federal University (Priority 2030)
- project Mirror Laboratories, HSE University, RF
We studied the influence of arsenic pressure on the low-temperature GaAs overgrowth of InAs quantum dots and their optical properties. High arsenic pressure led to a unimodal size distribution of quantum dots and lower photoluminescence intensity. Low arsenic pressure resulted in the formation of arrays of quantum dots with larger sizes.
We studied the influence of the arsenic pressure during low-temperature GaAs overgrowth of InAs quantum dots on their optical properties. In the photoluminescence spectrum of quantum dots overgrown at a high arsenic pressure, we observed a single broad line corresponding to unimodal size distribution of quantum dots. Meanwhile, two distinct peaks (similar to 1080 and similar to 1150 nm) at larger wavelengths are found in the spectra of samples with quantum dots overgrown at a low arsenic pressure. We attributed this phenomenon to the high-pressure suppression of atom diffusion between InAs islands at the overgrowth stage, which makes it possible to preserve the initial unimodal size distribution of quantum dots. The same overgrowth of quantum dots at the low arsenic pressure induces intensive mass transfer, which leads to the formation of arrays of quantum dots with larger sizes. Integrated photoluminescence intensity at 300 K is found to be lower for quantum dots overgrown at the higher arsenic pressure. However, a difference in the photoluminescence intensity for the high- and low-pressure overgrowths is not so significant for a temperature of 77 K. This indicates that excess arsenic incorporates into the capping layer at high arsenic pressures and creates numerous nonradiative recombination centers, diminishing the photoluminescence intensity.
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