期刊
PHYSICAL REVIEW APPLIED
卷 18, 期 6, 页码 -出版社
AMER PHYSICAL SOC
DOI: 10.1103/PhysRevApplied.18.064015
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Strain and composition are important in semiconductor physics, but nondestructive measurement of strain in epitaxial systems remains a challenge. This study demonstrates a microscopic mapping of strain and lattice orientation using scanning x-ray diffraction microscopy and applies it to study strain relaxation and indium incorporation phenomena.
Strain and composition play a fundamental role in semiconductor physics, since they are means to tune the electronic and optical properties of a material and hence develop alternative devices. Today it is still a challenge to measure strain in epitaxial systems in a nondestructive manner, which becomes especially important in strain-engineered devices that often are subjected to intense stress. In this work, we demon-strate a microscopic mapping of the full tensors of strain and lattice orientation by means of scanning x-ray diffraction microscopy. We develop a formalism to extract all components of strain and orientation from a set of scanning diffraction measurements and apply the technique to a patterned InxGa1-xN double layer to study strain relaxation and indium incorporation phenomena. The contributions due to varying indium content and threading dislocations are separated and analyzed.
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