期刊
NANOMATERIALS
卷 12, 期 24, 页码 -出版社
MDPI
DOI: 10.3390/nano12244457
关键词
pulsed plasma; SiO2 etching; high aspect ratio etching; capacitively coupled plasmas
类别
资金
- National Research Council of Science & Technology (NST) - Korean government (MSIP) [CRF-20-01-NFRI]
- Next-Generation Intelligence Semiconductor R&D Program through the Korea Evaluation Institute of Industrial Technology (KEIT) - Korean government (MOTIE)
- Korea Institute of Energy Technology Evaluation and Planning (KETEP)
- MOTIE of the Republic of Korea [20202010100020]
- MOTIE [1415179040, 1415179069, 1415181071, 1415180221]
- KSRC (Korea Semiconductor Research Consortium) [20009818, 20010420, 20019500, 20019473]
- Korea Institute for Advancement of Technology (KIAT) - Korean Government (MOTIE) [P0008458]
- Basic Science Research Program through the National Research Foundation of Korea (NRF) - Ministry of Education [NRF-2020R1A6A1A03047771]
- Samsung Electronics' University RD program
- 'Regional Innovation Strategy (RIS)' through the National Research Foundation of Korea(NRF) - Ministry of Education(MOE) [2021RIS-004]
- KIMM Institutional Program [NK236F]
- NST/KIMM
- Korea Evaluation Institute of Industrial Technology (KEIT) [20019473, 20019500] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
The etching characteristics of SiO2 were investigated, and a process window was identified. By adjusting the pulse-off time, the etching depth could be enhanced or reduced, depending on the radical flux.
SiO2 etching characteristics were investigated in detail. Patterned SiO2 was etched using radio-frequency capacitively coupled plasma with pulse modulation in a mixture of argon and fluorocarbon gases. Through plasma diagnostic techniques, plasma parameters (radical and electron density, self-bias voltage) were also measured. In this work, we identified an etching process window, where the etching depth is a function of the radical flux. Then, pulse-off time was varied in the two extreme cases: the lowest and the highest radical fluxes. It was observed that increasing pulse-off time resulted in an enhanced etching depth and the reduced etching depth respectively. This opposing trend was attributed to increasing neutral to ion flux ratio by extending pulse-off time within different etching regimes.
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