期刊
MICROMACHINES
卷 13, 期 11, 页码 -出版社
MDPI
DOI: 10.3390/mi13111940
关键词
NiO thin film; XRD; AFM; UV-Vis; contact angle; nanoindentation
类别
资金
- Ministry of Science and Technology, Taiwan
- MOST [110-2221-E-214-009]
The influence of substrate temperature on the structural, surface morphological, optical, and nanomechanical properties of NiO films deposited through radio-frequency magnetron sputtering on glass substrates was investigated. Results showed that the substrate temperature significantly affected the grain texturing, surface morphology, transmittance, optical band gap, hardness, Young's modulus, and wettability of the films.
The influence of the substrate temperature on the structural, surface morphological, optical and nanomechanical properties of NiO films deposited on glass substrates using radio-frequency magnetron sputtering was examined by X-ray diffraction (XRD), atomic force microscopy (AFM), UV-Visible spectroscopy and nanoindentation, respectively. The results indicate that the substrate temperature exhibits significant influences on both the grain texturing orientation and surface morphology of the films. Namely, the dominant crystallographic orientation of the films switches from (111) to (200) accompanied by progressively roughening of the surface when the substrate temperature is increased from 300 degrees C to 500 degrees C. The average transmittance of the NiO films was also found to vary in the range of 60-85% in the visible wavelength region, depending on the substrate temperature and wavelength. In addition, the optical band gap calculated from the Tauc plot showed an increasing trend from 3.18 eV to 3.56 eV with increasing substrate temperature. Both the hardness and Young's modulus of NiO films were obtained by means of the nanoindentation continuous contact stiffness measurements mode. Moreover, the contact angle between the water droplet and film surface also indicated an intimate correlation between the surface energy, hence the wettability, of the film and substrate temperature.
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