The Influence of the ITO Layers' Thicknesses on Their Chosen Physical Surface Parameters

The paper presents the results concerning the influence of the thickness of the ITO and In2O3 layers deposited by the magnetron sputtering method on the physical parameters characterising their surface properties. The characterisation parameters were obtained by atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), and Kelvin probe. The increase in the layers' thickness related to the time of their fabrication causes an increase in the surface roughness and the value of the work function, followed by a decrease in the concentration of elements and compounds in the near-surface area.

Automated summary

The paper investigates the influence of the thickness of the ITO and In2O3 layers deposited by magnetron sputtering on their physical properties. Characterization parameters were determined using AFM, XPS, and Kelvin probe. Increasing the layer thickness resulted in increased surface roughness and work function, accompanied by a decrease in the concentration of elements and compounds in the near-surface region.