期刊
MATERIALS
卷 15, 期 21, 页码 -出版社
MDPI
DOI: 10.3390/ma15217525
关键词
ceria-based abrasives; rare earth precursors; chemical mechanical polishing; TFT-LCD glass substrates
类别
资金
- National Key R&D Program of China [2021YFB3501100]
- Guiding Local Funding Projects for Scientific and Technological Development by Central Government in Hebei [216Z1402G]
- Science and Technology Innovation Fund of GRINM Group Co., Ltd. [G12620203102046]
Different morphologies of rare earth carbonates were studied for their influence on the performance of ceria-based abrasives. It was found that ceria-based abrasives prepared from nearly monodisperse near-spherical precursors exhibited better uniformity and higher dispersion, achieving the lowest R-a and a higher MRR during polishing of TFT-LCD glass substrates.
Ceria-based abrasives are widely used in precision chemical mechanical polishing (CMP) fields, such as thin film transistor liquid crystal display (TFT-LCD) glass substrates and integrated circuits, because of their excellent physicochemical properties. Rare earth carbonates, as precursors of ceria-based abrasives, directly affect the morphology of ceria-based abrasives, which, in turn, affects the material removal rate (MRR) and the surface roughness (R-a) after polishing. Herein, rare earth carbonates with different morphologies were obtained by adjusting reaction parameters during precipitation, including flake, spindle, and spheroid. Moreover, the phase of precursors was analyzed, and the evolution process of morphology from precursors to ceria-based abrasives was investigated. Furthermore, the effect of precursors on the polishing performance of ceria-based abrasives was explored. The results show that the primary particles of ceria-based abrasives are near-spherical, but the morphology and dispersion of the secondary particles are obviously inherited from precursors. Among them, near-spherical ceria-based abrasives prepared by nearly monodisperse near-spherical precursors show better uniformity and higher dispersion, and they not only achieve the lowest R-a but also obtain a higher MRR of 555 nm/min (9 wt.%) for polishing TFT-LCD glass substrates. The result is significant for the further optimization and application of high-performance ceria-based abrasives.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据