Visible and near-infrared ridge waveguides in fused silica glasses by oxygen ion implantation and femtosecond laser ablation

A two-dimensional waveguide is the building block in integrated photonic circuits. In this work, the 5.0 MeV oxygen ion implantation at a dose of 5.0 x 10(14) ions/cm(2) was carried out on the fused silica glass for the formation of the planar waveguide. Then, a femtosecond laser was employed to ablate the ion-implanted surface at a speed of 200 mu m/s for the construction of the ridge waveguide. The energy depositions of the oxygen ion implantation into the fused silica glass were simulated by the SRIM 2013. The microscopic morphology of the ridge waveguide was photographed by a Nikon microscope. The near-field intensity distributions of the ridge waveguide at 532 nm and 976 nm were measured by using the end-face coupling system. The ion-implanted and femtosecond-ablated ridge waveguide on the fused silica glass has the potential as a photonic device for integrated optical systems at the visible and near-infrared bands.

Automated summary

In this study, a planar waveguide and a ridge waveguide were constructed on the fused silica glass by 5.0 MeV oxygen ion implantation and femtosecond laser ablation. The energy depositions of the ion implantation were simulated and the microscopic morphology of the ridge waveguide was photographed. The near-field intensity distributions of the ridge waveguide at different wavelengths were measured. The ion-implanted and femtosecond-ablated ridge waveguide shows potential for integrated optical systems.