Fast measurement of surface defects on large components with dynamic phase-shifting digital holographic microscopy

The microscopic characterization of the surface defects on large opto-electronics components is essential to ensure the performance of major equipment. However, existing technology cannot achieve efficient and reliable fast cross-scale measurement due to the requirement on vertical scanning or polarization modulation for multi-frame capturing at each position. An effective approach is proposed to solve this problem, which needs to record only one interferometric hologram at each location and achieves full-area measurement by traversing over the surface. The overlapped area between adjacent regions are specified by wavefront registration and the topog-raphy in this area is obtained by two-step phase shifting and holographic reconstruction. Experimental results demonstrate that the proposed method can achieve fast and fast measurement of large specular components with high accuracy and high efficiency.

Automated summary

A proposed method using interferometric holography and wavefront registration achieves fast and efficient cross-scale measurement of surface defects on large opto-electronics components.