相关参考文献
注意：仅列出部分参考文献，下载原文获取全部文献信息。Multiscale plasma and feature profile simulations of plasma-enhanced chemical vapor deposition and atomic layer deposition processes for titanium thin film fabrication
Kazuki Denpoh et al.
JAPANESE JOURNAL OF APPLIED PHYSICS (2020)
Effects of driving frequency on plasma density in Ar and H2/Ar capacitively coupled plasmas at Torr-order pressure
Kazuki Denpoh
JAPANESE JOURNAL OF APPLIED PHYSICS (2020)
A set of cross sections and transport coefficients for CF3+ ions in CF4
J. Jovanovic et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2019)
Computational study on silicon oxide plasma enhanced chemical vapor deposition (PECVD) process using tetraethoxysilane/oxygen/argon/ helium
Hu Li et al.
JAPANESE JOURNAL OF APPLIED PHYSICS (2019)
Dissociative reactions induced by electron impact and electron transport in TEOS vapor
Satoru Kawaguchi et al.
JAPANESE JOURNAL OF APPLIED PHYSICS (2019)
Impact of ion energies in Ar/H2 capacitively coupled radio frequency discharges on PEALD processes of titanium films
Shinya Iwashita et al.
SURFACE & COATINGS TECHNOLOGY (2018)
H+ Scattering in n-Butanol
Z. Nikitovic et al.
ACTA PHYSICA POLONICA A (2017)
Cross Sections and Transport Properties for Na+ in (DXE) Gas
Zeljka D. Nikitovic et al.
SCIENCE OF SINTERING (2016)
Effect of exothermic reactions on the mobility of Ar+ in CF4
Z. Raspopovic et al.
EPL (2015)
Cross sections and transport of O- in H2O vapour at low pressures
Vladimir Stojanovic et al.
EUROPEAN PHYSICAL JOURNAL D (2015)
Modeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regime
Yu-Ru Zhang et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2015)
Simulation of ion energy and angular distribution functions using Monte Carlo method coupled with multidimensional radio frequency sheath model developed utilizing COMSOL Multiphysics
Kazuki Denpoh
JAPANESE JOURNAL OF APPLIED PHYSICS (2014)
Mobility of positive ions in CF4
V. Stojanovic et al.
18TH INTERNATIONAL SUMMER SCHOOL ON VACUUM, ELECTRON AND ION TECHNOLOGIES (VEIT2013) (2014)
Dissociation limit and dissociation dynamic of CF4+: Application of threshold photoelectron-photoion coincidence velocity imaging
Xiaofeng Tang et al.
JOURNAL OF CHEMICAL PHYSICS (2013)
The LXCat project: Electron scattering cross sections and swarm parameters for low temperature plasma modeling
S. Pancheshnyi et al.
CHEMICAL PHYSICS (2012)
Particle-in-Cell/Monte Carlo Collision Simulations of Striations in Inductively Coupled Plasmas
Kazuki Denpoh
JAPANESE JOURNAL OF APPLIED PHYSICS (2012)
Locally enhanced discharges at gas hole outlets of a showerhead in a plasma etching reactor
K. Denpoh
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2009)
Test particle simulation of the role of ballistic electrons in hybrid dc/rf capacitively coupled CF4 plasmas
P. L. G. Ventzek et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2009)
Test particle simulation of the role of ballistic electrons in hybrid dc/rf capacitively coupled plasmas in argon
K. Denpoh et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2008)
Analysis of a capacitively coupled dual-frequency CF4 discharge
Z. Donko et al.
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS (2006)
Plasma characteristics of an Ar/CF4/N2 discharge in an asymmetric dual frequency reactor:: numerical investigation by a PIC/MC model
V. Georgieva et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2006)
Numerical simulation of dual frequency etching reactors: Influence of the external process parameters on the plasma characteristics
V Georgieva et al.
JOURNAL OF APPLIED PHYSICS (2005)
Numerical investigation of ion-energy-distribution functions in single and dual frequency capacitively coupled plasma reactors
V Georgieva et al.
PHYSICAL REVIEW E (2004)
Particle-in-cell/Monte Carlo simulation of a capacitively coupled radio frequency Ar/CF4 discharge:: Effect of gas composition
V Georgieva et al.
JOURNAL OF APPLIED PHYSICS (2003)
Database in low temperature plasma modeling
Y Sakai
APPLIED SURFACE SCIENCE (2002)
Self-consistent particle simulation of radio frequency CF4 discharge:: Effect of gas pressure
K Denpoh et al.
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS (2000)
分享论文
