4.6 Article

Interfacial variation in HfO2-based resistive switching devices with titanium electrodes under asymmetric bias operation

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Summary: This paper investigates a new Ti/HfO2:Al/Pt sandwiched structure for resistive switching characteristics, studying the variation in conductance under different amplitudes and voltage pulse widths. It was found that the switching parameters in resistive random-access memory (RRAM) are impacted by the initial conductance states. The device can achieve a preset resistance value range by energizing a single voltage amplitude pulse, and it can be used for neuromorphic applications to simulate the strength change observed in biological synapses.

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