期刊
APPLIED SURFACE SCIENCE
卷 605, 期 -, 页码 -出版社
ELSEVIER
DOI: 10.1016/j.apsusc.2022.154630
关键词
XPS; GCIB; HAXPES; MOVPE; Valence band offset; GaP(As)/Si
类别
资金
- Czech Science Foundation (GACR) [18-06970J]
- German Research Foundation (DFG) [HA3096/10-1, PAK 981]
- Federal Ministry of Education and Research (BMBF project H2Demo)
- Operational Program Research, Development and Education - European Structural and Investment Funds
- Czech Ministry of Education, Youth and Sports [SOLID21 -CZ.02.1.01/0.0/0.0/16_019/0000760]
- MEXT, Japan [12024046]
- Federal Ministry of Education and Research (BMBF)
- Ministry of Education, Youth, and Sports of the Czech Republic [LM2010005]
This study investigates the epitaxial growth of GaP films on As-terminated Si substrates and reveals the localization of As atoms in the GaP lattice and at the GaP/Si interface. Chemical shifts in As core levels were observed, and similar valence band offset values were obtained regardless of the doping type, substrate miscut, or As-terminated surface of the Si substrate. The band alignment diagram of the GaP(As)/Si(100) heterostructure was also deduced.
The epitaxial growth of the polar GaP(100) on the nonpolar Si(100) substrate suffers from inevitable defects at the antiphase domain boundaries (APDs), resulting from mono-atomic steps on the Si(100) surface. Stabilization of Si(100) substrate surfaces with As is a promising technological step enabling the preparation of Si substrates with double atomic steps and reduced density of the APDs. In this paper, 4-50-nm-thick GaP epitaxial films were grown on As-terminated Si(100) substrates with different types of doping, miscuts, and As-surface termination by metalorganic vapor phase epitaxy (MOVPE). The GaP(As)/Si(100) heterostructures were investigated by X-ray photoelectron spectroscopy (XPS) combined with gas cluster ion beam (GCIB) sputtering and by hard X-ray photoelectron spectroscopy (HAXPES). We found residuals of As atoms in the GaP lattice (similar to 0.2-0.3 at.%) and a localization of As atoms at the GaP(As)/Si(100) interface (similar to 1 at.%). Deconvolution of core level peaks revealed interface core level shifts. In As core levels, chemical shifts between 0.5 and 0.8 eV were measured and identified by angle-resolved XPS measurements. Similar valence band offset (VBO) values of 0.6 eV were obtained, regardless of the doping type of Si substrate, Si substrate miscut or type of As-terminated Si substrate surface. The band alignment diagram of the GaP(As)/Si(1 0 0) heterostructure was deduced.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据