4.7 Article

Combining advanced photoelectron spectroscopy approaches to analyse deeply buried GaP(As)/Si(100) interfaces: Interfacial chemical states and complete band energy diagrams

期刊

APPLIED SURFACE SCIENCE
卷 605, 期 -, 页码 -

出版社

ELSEVIER
DOI: 10.1016/j.apsusc.2022.154630

关键词

XPS; GCIB; HAXPES; MOVPE; Valence band offset; GaP(As)/Si

资金

  1. Czech Science Foundation (GACR) [18-06970J]
  2. German Research Foundation (DFG) [HA3096/10-1, PAK 981]
  3. Federal Ministry of Education and Research (BMBF project H2Demo)
  4. Operational Program Research, Development and Education - European Structural and Investment Funds
  5. Czech Ministry of Education, Youth and Sports [SOLID21 -CZ.02.1.01/0.0/0.0/16_019/0000760]
  6. MEXT, Japan [12024046]
  7. Federal Ministry of Education and Research (BMBF)
  8. Ministry of Education, Youth, and Sports of the Czech Republic [LM2010005]

向作者/读者索取更多资源

This study investigates the epitaxial growth of GaP films on As-terminated Si substrates and reveals the localization of As atoms in the GaP lattice and at the GaP/Si interface. Chemical shifts in As core levels were observed, and similar valence band offset values were obtained regardless of the doping type, substrate miscut, or As-terminated surface of the Si substrate. The band alignment diagram of the GaP(As)/Si(100) heterostructure was also deduced.
The epitaxial growth of the polar GaP(100) on the nonpolar Si(100) substrate suffers from inevitable defects at the antiphase domain boundaries (APDs), resulting from mono-atomic steps on the Si(100) surface. Stabilization of Si(100) substrate surfaces with As is a promising technological step enabling the preparation of Si substrates with double atomic steps and reduced density of the APDs. In this paper, 4-50-nm-thick GaP epitaxial films were grown on As-terminated Si(100) substrates with different types of doping, miscuts, and As-surface termination by metalorganic vapor phase epitaxy (MOVPE). The GaP(As)/Si(100) heterostructures were investigated by X-ray photoelectron spectroscopy (XPS) combined with gas cluster ion beam (GCIB) sputtering and by hard X-ray photoelectron spectroscopy (HAXPES). We found residuals of As atoms in the GaP lattice (similar to 0.2-0.3 at.%) and a localization of As atoms at the GaP(As)/Si(100) interface (similar to 1 at.%). Deconvolution of core level peaks revealed interface core level shifts. In As core levels, chemical shifts between 0.5 and 0.8 eV were measured and identified by angle-resolved XPS measurements. Similar valence band offset (VBO) values of 0.6 eV were obtained, regardless of the doping type of Si substrate, Si substrate miscut or type of As-terminated Si substrate surface. The band alignment diagram of the GaP(As)/Si(1 0 0) heterostructure was deduced.

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