期刊
APPLIED PHYSICS LETTERS
卷 121, 期 23, 页码 -出版社
AIP Publishing
DOI: 10.1063/5.0129445
关键词
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资金
- JST, CREST, Japan [JPMJCR21C2]
- Nano Processing Facility, AIST-NPF
In this study, the fabrication and investigation of Schottky barrier contact on n- and p-type In0.53Ga0.47As with transparent conductive oxide (TCO) that transmits light is presented. The contact shows explicit rectifying behavior and insertion of an ultra-thin Ni-layer reduces contact resistivity significantly. This contact has potential for broadband light detection in the optical communication band.
In this study, we fabricate and investigate Schottky barrier contact on n- and p-type In0.53Ga0.47As with transparent conductive oxide (TCO) that transmits light from the visible to short-wave infrared (SWIR) region. The TCO/p-In0.53Ga0.47As contact exhibits explicit rectifying behavior in current-voltage measurement, with an effective Schottky barrier height of 0.587 eV (I-V) and 0.567 eV (C-V). Conversely, the TCO/n-In0.53Ga0.47As exhibits the Ohmic behavior. From high-resolution transmission electron microscopy observations, we identified two types of interfacial layers between TCO and InGaAs: an In/Ga-rich InGaAs oxide layer and an In/Ga-deficient InGaAs layer. These interfacial layers may have a significant impact on the performance of the Schottky barrier contact. An ultra-thin Ni-layer insertion at the TCO/n(+)-InGaAs interface reduces the contact resistivity by more than an order of magnitude while maintaining high transparency. The TCO/p-InGaAs Schottky barrier contact also performs broadband light detection from the visible to SWIR region in a front-side illumination manner, which is highly promising for detecting wavelengths covering the optical communication band. Published under an exclusive license by AIP Publishing.
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