4.6 Article

Interface barrier-induced conversion of resistive switching mechanism in Mn-doped BiFeO3 memristor

期刊

APPLIED PHYSICS LETTERS
卷 121, 期 20, 页码 -

出版社

AIP Publishing
DOI: 10.1063/5.0127006

关键词

-

资金

  1. National Key R&D Plan of MOST of China [2021ZD0201203]
  2. National Key Research and Development Program of China [2019YFB2205100]
  3. Hubei Key Laboratory of Advanced Memories
  4. Hubei Engineering Research Center on Microelectronics
  5. Chua Memristor Institute

向作者/读者索取更多资源

Interface-type devices, unlike conductive filament (CF)-type devices, demonstrate continuous conductance changes and have the potential to be used as artificial synapses. This paper investigates Mn-doped BiFeO3 (BFMO) devices with different bottom electrodes and reveals their diverse resistance-switching behaviors. By fabricating a hetero-junction device with a Nb-doped SrTiO3 (NSTO) bottom electrode, the polarity of operation is reversed, leading to barrier transition-dominated conductive behavior in the BFMO-based memristor. The device exhibits various desirable characteristics such as a high ON/OFF ratio, favorable stability, multi-value characteristics, and synaptic plasticity.
Different from conductive filament (CF)-type counterparts, interface-type devices exhibit continuously gradual conductance changes, making them the potential for artificial synapses. In this paper, Mn-doped BiFeO3 (BFMO) devices with SrRuO3 and TiN bottom electrodes demonstrate the clear CF rather than the interface barrier type resistance-switching feature due to the high Schottky barrier. Considering the measured electron affinity of 3.52 eV and work function of 4.22 eV in the as-synthesized BFMO film (a weak n-type semiconductor, marked as n(-)), we fabricated a hetero-junction device with the Nb-doped SrTiO3 (NSTO) bottom electrode (a strong n-type semiconductor, marked as n(+)) exhibiting analog switch characteristics. The n(-)-n(+) hetero-junction between BFMO and NSTO reverses the operation polarity and leads to a barrier transition-dominated conductive behavior in the BFMO-based memristor. The device shows a large ON/OFF ratio over 1200, favorable stability after 10(4) s, continual multi-value characteristics, symmetrical long-term potentiation and depression, and synaptic plasticity with about 80 ns time constant. The investigation of resistive switching features, band structure, and synapse performance in this work provides a reference for the application of BiFeO3 in the field of the memristor. Published under an exclusive license by AIP Publishing.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.6
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据