4.3 Article

Formation mechanism and regulation of silicon vacancycenters in polycrystalline diamond films br

期刊

ACTA PHYSICA SINICA
卷 72, 期 3, 页码 -

出版社

CHINESE PHYSICAL SOC
DOI: 10.7498/aps.72.20221437

关键词

diamond; silicon vacancy center; photoluminescence; Raman spectroscopy

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The formation mechanism and regulation method of SiV center during the growth of polycrystalline diamond on silicon substrate are investigated. By adjusting the nitrogen and oxygen content in the growing atmosphere, the photoluminescence intensity of SiV center can be effectively controlled. The study shows that nitrogen promotes the formation of SiV center while oxygen inhibits it. The surface morphology and photoluminescence spectrum further demonstrate that the photoluminescence intensity of SiV center is correlated with the grain size of diamond and the preferred crystal orientation. The results provide a theoretical basis for the development and application of SiV centers in diamond.
Diamond silicon vacancy centers (SiV centers) have important application prospects in quantuminformation technology and biomarkers. In this work, the formation mechanism and regulation method of SiVcenter during the growth of polycrystalline diamond on silicon substrate are studied. By changing the ratio ofnitrogen content to oxygen content in the growing atmosphere of diamond, the photoluminescence intensity ofSiV center can be controlled effectively, and polycrystalline diamond samples with the ratios of SiV centerphotoluminescence peak to diamond intrinsic peak as high as 334.46 and as low as 1.48 are prepared. It is foundthat nitrogen promotes the formation of SiV center in the growth process, and the inhibition of oxygen. Thesurface morphology and photoluminescence spectrum for each of these samples show that the photoluminescencepeak intensity of SiV center is positively correlated with the grain size of diamond, and the SiV center'sphotoluminescence peak in the diamond film with obvious preferred orientation of crystal plane is higher. Thedistribution of Si centers and SiV centers on the surface of polycrystalline diamond are further characterizedand analyzed by photoluminescence, Raman surface scanning and depth scanning spectroscopy. It is found thatduring the growth of polycrystalline diamond, the substrate silicon diffuses first into the diamond grain andthen into the crystal structure to form the SiV center. This paper provides a theoretical basis for thedevelopment and application of SiV centers in diamond

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