Inhibitory property of lithium phosphorus oxynitride surface grown by atomic layer deposition

Lithium phosphorus oxynitride (LiPON) has gained ever-growing interest in micro-battery fabrication due to its three-dimensional uniform atomic layer deposition (ALD). Recent investigations have focused on finding new strategies to study the passivation behavior of LiPON films. In this work, LiPON film was grown by ALD with precursors of lithium hexamethyldisilazide and diethyl phosphoramidate. X-ray photoelectron spectroscopy and atomic force microscopy were employed to fully characterize the surface properties of LiPON films deposited by different deposition processes. Strong inhibition is observed with respect to the subsequent ALD of oxides. The detailed analysis also demonstrates that the inhibiting ability of the LiPON thin film would be gradually reduced with respect to prolonged air exposure.

Automated summary

The LiPON film grown by atomic layer deposition (ALD) shows strong inhibition towards the subsequent ALD of oxides, but its inhibiting ability gradually decreases with prolonged air exposure.