相关参考文献
注意:仅列出部分参考文献,下载原文获取全部文献信息。Insertion of Dielectric Interlayer: A New Approach to Enhance Energy Storage in HfxZr1-xO2 Capacitors
Dipjyoti Das et al.
IEEE ELECTRON DEVICE LETTERS (2021)
A Comparative Study on the Ferroelectric Performances in Atomic Layer Deposited Hf0.5Zr0.5O2 Thin Films Using Tetrakis(ethylmethylamino) and Tetrakis(dimethylamino) Precursors
Baek Su Kim et al.
NANOSCALE RESEARCH LETTERS (2020)
The electrocaloric effect in doped hafnium oxide: Comparison of direct and indirect measurements
C. Mart et al.
APPLIED PHYSICS LETTERS (2020)
Energy Harvesting in the Back-End of Line with CMOS Compatible Ferroelectric Hafnium Oxide
C. Mart et al.
2020 IEEE INTERNATIONAL ELECTRON DEVICES MEETING (IEDM) (2020)
Demonstration of BEOL-compatible ferroelectric Hf0.5Zr0.5O2 scaled FeRAM co-integrated with 130nm CMOS for embedded NVM applications
T. Francois et al.
2019 IEEE INTERNATIONAL ELECTRON DEVICES MEETING (IEDM) (2019)
Critical Role of Interlayer in Hf0.5Zr0.5O2 Ferroelectric FET Nonvolatile Memory Performance
Kai Ni et al.
IEEE TRANSACTIONS ON ELECTRON DEVICES (2018)
The effect of the bottom electrode on ferroelectric tunnel junctions based on CMOS-compatible HfO2
Youngin Goh et al.
NANOTECHNOLOGY (2018)
Epitaxial ferroelectric Hf0.5Zr0.5O2 thin film on a buffered YSZ substrate through interface reaction
Tao Li et al.
JOURNAL OF MATERIALS CHEMISTRY C (2018)
Preparation and characterization of ferroelectric Hf0.5Zr0.5O2 thin films grown by reactive sputtering
Young Hwan Lee et al.
NANOTECHNOLOGY (2017)
An extensive study of the influence of dopants on the ferroelectric properties of HfO2
S. Starschich et al.
JOURNAL OF MATERIALS CHEMISTRY C (2017)
Ferroelectric and piezoelectric properties of Hf1-xZrxO2 and pure ZrO2 films
S. Starschich et al.
APPLIED PHYSICS LETTERS (2017)
Impact of mechanical stress on ferroelectricity in (Hf0.5Zr0.5)O2 thin films
Takahisa Shiraishi et al.
APPLIED PHYSICS LETTERS (2016)
Ferroelectricity in undoped-HfO2 thin films induced by deposition temperature control during atomic layer deposition
K. D. Kim et al.
JOURNAL OF MATERIALS CHEMISTRY C (2016)
Ferroelectric HfO2-based materials for next-generation ferroelectric memories
Zhen Fan et al.
JOURNAL OF ADVANCED DIELECTRICS (2016)
The origin of ferroelectricity in Hf1-xZrxO2: A computational investigation and a surface energy model
R. Materlik et al.
JOURNAL OF APPLIED PHYSICS (2015)
Chemical Solution Deposition of Ferroelectric Hafnium Oxide for Future Lead Free Ferroelectric Devices
Sergej Starschich et al.
ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY (2015)
Stabilizing the ferroelectric phase in doped hafnium oxide
M. Hoffmann et al.
JOURNAL OF APPLIED PHYSICS (2015)
Chemical solution deposition of ferroelectric yttrium-doped hafnium oxide films on platinum electrodes
S. Starschich et al.
APPLIED PHYSICS LETTERS (2014)
Study on the degradation mechanism of the ferroelectric properties of thin Hf0.5Zr0.5O2 films on TiN and Ir electrodes
Min Hyuk Park et al.
APPLIED PHYSICS LETTERS (2014)
Grain size engineering for ferroelectric Hf0.5Zr0.5O2 films by an insertion of Al2O3 interlayer
Han Joon Kim et al.
APPLIED PHYSICS LETTERS (2014)
Evolution of phases and ferroelectric properties of thin Hf0.5Zr0.5O2 films according to the thickness and annealing temperature
Min Hyuk Park et al.
APPLIED PHYSICS LETTERS (2013)
Impact of layer thickness on the ferroelectric behaviour of silicon doped hafnium oxide thin films
Ekaterina Yurchuk et al.
THIN SOLID FILMS (2013)
Ferroelectricity in Simple Binary ZrO2 and HfO2
Johannes Mueller et al.
NANO LETTERS (2012)
NIH Image to ImageJ: 25 years of image analysis
Caroline A. Schneider et al.
NATURE METHODS (2012)
Ferroelectricity in hafnium oxide thin films
T. S. Boescke et al.
APPLIED PHYSICS LETTERS (2011)
Grain Size and Film Thickness Effect on the Thermal Expansion Coefficient of FCC Metallic Thin Films
Seulgi Hwang et al.
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY (2011)