相关参考文献
注意:仅列出部分参考文献,下载原文获取全部文献信息。Order of magnitude enhancement of inherently selective atomic layer deposition of zirconia on silicon without deposition on copper: The role of precursor
Soumya Saha et al.
VACUUM (2022)
Next generation nanopatterning using small molecule inhibitors for area-selective atomic layer deposition
Josiah Yarbrough et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2021)
Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
Karsten Arts et al.
CHEMISTRY OF MATERIALS (2021)
Inherently Area-Selective Atomic Layer Deposition of SiO2 Thin Films to Confer Oxide Versus Nitride Selectivity
Jinseon Lee et al.
ADVANCED FUNCTIONAL MATERIALS (2021)
Understanding chemical and physical mechanisms in atomic layer deposition
Nathaniel E. Richey et al.
JOURNAL OF CHEMICAL PHYSICS (2020)
Insight into Selective Surface Reactions of Dimethylamino-trimethylsilane for Area-Selective Deposition of Metal, Nitride, and Oxide
Job Soethoudt et al.
JOURNAL OF PHYSICAL CHEMISTRY C (2020)
Mechanisms of Thermal Atomic Layer Etching
Steven M. George
ACCOUNTS OF CHEMICAL RESEARCH (2020)
Area-Selective Atomic Layer Deposition of TiN Using Aromatic Inhibitor Molecules for Metal/Dielectric Selectivity
Marc J. M. Merkx et al.
CHEMISTRY OF MATERIALS (2020)
Effects of Al Precursors on Deposition Selectivity of Atomic Layer Deposition of Al2O3 Using Ethanethiol Inhibitor
Hyun Gu Kim et al.
CHEMISTRY OF MATERIALS (2020)
Substrate-Dependent Study of Chain Orientation and Order in Alkylphosphonic Acid Self-Assembled Monolayers for ALD Blocking
Dara Bobb-Semple et al.
LANGMUIR (2020)
Area-Selective Atomic Layer Deposition Assisted by Self-Assembled Monolayers: A Comparison of Cu, Co, W, and Ru
Dara Bobb-Semple et al.
CHEMISTRY OF MATERIALS (2019)
Molecular mechanisms of atomic layer etching of cobalt with sequential exposure to molecular chlorine and diketones
Mahsa Konh et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2019)
Atomic layer etching of SiO2 with Ar and CHF3 plasmas: A self-limiting process for aspect ratio independent etching
Stefano Dallorto et al.
PLASMA PROCESSES AND POLYMERS (2019)
From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity
Adriaan J. M. Mackus et al.
CHEMISTRY OF MATERIALS (2019)
Vapor-deposited octadecanethiol masking layer on copper to enable area selective Hf3N4 atomic layer deposition on dielectrics studied by in situ spectroscopic ellipsometry
Laurent Lecordier et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2018)
Atomic Layer Etching: Rethinking the Art of Etch
Keren J. Kanarik et al.
JOURNAL OF PHYSICAL CHEMISTRY LETTERS (2018)
Area-Selective Atomic Layer Deposition Using Si Precursors as Inhibitors
Rizwan Khan et al.
CHEMISTRY OF MATERIALS (2018)
Thermal Atomic Layer Etching of Silicon Using O2, HF, and Al(CH3)3 as the Reactants
Aziz I. Abdulagatov et al.
CHEMISTRY OF MATERIALS (2018)
Atomic layer etching of silicon nitride using infrared annealing for short desorption time of ammonium fluorosilicate
Nobuya Miyoshi et al.
JAPANESE JOURNAL OF APPLIED PHYSICS (2017)
Predicting synergy in atomic layer etching
Keren J. Kanarik et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2017)
Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
Alfredo Mameli et al.
ACS NANO (2017)
Reaction Mechanism of Area-Selective Atomic Layer Deposition for Al2O3 Nanopatterns
Seunggi Seo et al.
ACS APPLIED MATERIALS & INTERFACES (2017)
Thermal Selective Vapor Etching of TiO2: Chemical Vapor Etching via WF6 and Self-Limiting Atomic Layer Etching Using WF6 and BCl3
Paul C. Lemaire et al.
CHEMISTRY OF MATERIALS (2017)
Thermal Atomic Layer Etching of SiO2 by a Conversion-Etch Mechanism Using Sequential Reactions of Trimethylaluminum and Hydrogen Fluoride
Jaime W. DuMont et al.
ACS APPLIED MATERIALS & INTERFACES (2017)
Thermal Atomic Layer Etching of ZnO by a Conversion-Etch Mechanism Using Sequential Exposures of Hydrogen Fluoride and Trimethylaluminum
David R. Zywotko et al.
CHEMISTRY OF MATERIALS (2017)
Selective Deposition of Dielectrics: Limits and Advantages of Alkanethiol Blocking Agents on Metal-Dielectric Patterns
Fatemeh Sadat Minaye Hashemi et al.
ACS APPLIED MATERIALS & INTERFACES (2016)
Prospects for Thermal Atomic Layer Etching Using Sequential, Self-Limiting Fluorination and Ligand-Exchange Reactions
Steven M. George et al.
ACS NANO (2016)
Using Hydrogen To Expand the Inherent Substrate Selectivity Window During Tungsten Atomic Layer Deposition
Berc Kalanyan et al.
CHEMISTRY OF MATERIALS (2016)
Effect of substrate composition on atomic layer deposition using self-assembled monolayers as blocking layers
Wenyu Zhang et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2016)
Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
Alexander Strobel et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2016)
Sequential Regeneration of Self-Assembled Monolayers for Highly Selective Atomic Layer Deposition
Fatemeh Sadat Minaye Hashemi et al.
ADVANCED MATERIALS INTERFACES (2016)
Area-Selective Atomic Layer Deposition: Conformal Coating, Subnanometer Thickness Control, and Smart Positioning
Ming Fang et al.
ACS NANO (2015)
Atomic Layer Etching at the Tipping Point: An Overview
G. S. Oehrlein et al.
ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY (2015)
Atomic Layer Etching: What Can We Learn from Atomic Layer Deposition?
T. Faraz et al.
ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY (2015)
Atomic Layer Etching: An Industry Perspective
Colin T. Carver et al.
ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY (2015)
How to make lithography patterns print: the role of OPC and pattern layout
Peter De Bisschop
ADVANCED OPTICAL TECHNOLOGIES (2015)
Atomic Layer Deposition Assisted Pattern Multiplication of Block Copolymer Lithography for 5 nm Scale Nanopatterning
Hyoung-Seok Moon et al.
ADVANCED FUNCTIONAL MATERIALS (2014)
A Short History of Atomic Layer Deposition: Tuomo Suntola's Atomic Layer Epitaxy
Riikka L. Puurunen
CHEMICAL VAPOR DEPOSITION (2014)
The use of atomic layer deposition in advanced nanopatterning
A. J. M. Mackus et al.
NANOSCALE (2014)
Moore's Law: The First Ending and a New Beginning
Andrew A. Chien et al.
COMPUTER (2013)
Overview: Continuous evolution on double-patterning process
Hidetami Yaegashi et al.
ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXIX (2012)
Etch Challenges for 1x nm NAND Flash
Myung Kyu Ahn et al.
ADVANCED ETCH TECHNOLOGY FOR NANOPATTERNING (2012)
Atomic Layer Deposition: An Overview
Steven M. George
CHEMICAL REVIEWS (2010)
Etching of Nb2O5 Thin Films by NbCl5
Kjell Knapas et al.
CHEMICAL VAPOR DEPOSITION (2009)
The quantum limit to Moore's law
James R. Powell
PROCEEDINGS OF THE IEEE (2008)
Chemistry for positive pattern transfer using area-selective atomic layer deposition
R Chen et al.
ADVANCED MATERIALS (2006)
Achieving area-selective atomic layer deposition on patterned substrates by selective surface modification
R Chen et al.
APPLIED PHYSICS LETTERS (2005)
Low-temperature Al2O3 atomic layer deposition
MD Groner et al.
CHEMISTRY OF MATERIALS (2004)
Self-assembled monolayer resist for atomic layer deposition of HfO2 and ZrO2 high-κ gate dielectrics
R Chen et al.
APPLIED PHYSICS LETTERS (2004)
Crystallization behavior of thin ALD-Al2O3 filMS
S Jakschik et al.
THIN SOLID FILMS (2003)
Thin film atomic layer deposition equipment for semiconductor processing
O Sneh et al.
THIN SOLID FILMS (2002)