4.5 Article

Avoiding Shading Losses in Concentrator Photovoltaics Using a Soft-Imprinted Cloaking Geometry

期刊

IEEE JOURNAL OF PHOTOVOLTAICS
卷 12, 期 5, 页码 1116-1127

出版社

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/JPHOTOV.2022.3182277

关键词

Silicon; Metals; Photovoltaic systems; Optical refraction; Optical device fabrication; Absorption; Photovoltaic cells; Concentrator photovoltaics (CPV); contact cloaking; high-efficiency photovoltaics; resistive loss; shading loss; soft-imprint lithography; transparent contacts

资金

  1. NSW Node of the Australian National Fabrication Facility
  2. Australian Government through the Australian Renewable Energy Agency
  3. Australian Centre of Advanced Photovoltaics
  4. Australian Government through the Australian Research Council's DECRA program [DE210100453]
  5. Research and Prototype Foundry Core Research Facility at the University of Sydney
  6. Australian National Fabrication Facility
  7. Australian Research Council [DE210100453] Funding Source: Australian Research Council

向作者/读者索取更多资源

Shading losses have always been a challenge in photovoltaic devices, but this study presents a simple and scalable fabrication method to minimize shading losses while achieving large front metal coverage. The use of soft imprint lithography allows for the creation of trenches that enable optical cloaking, resulting in improved efficiency in photovoltaic cells.
Shading losses are a longstanding obstacle in photovoltaic devices, particularly in concentrator photovoltaics, where the tradeoff between shading and resistive losses limits the concentration at which the highest power conversion efficiency is achieved to values far below the capabilities of concentrator optics. Here, we demonstrate a simple and scalable fabrication method that enables large front metal coverage while keeping shading losses to a minimum. Soft-imprint lithography is used to create trenches in a transparent polymer above the metal contacts, enabling cloaking via refraction at a range of angles near normal incidence. Using optical characterization techniques, we first confirm that the metal contacts are indeed optically cloaked. We then demonstrate an increase in short-circuit current density from 29.95 to 39.12 mA/cm(2) for a Si solar cell with 25% front metal coverage before and after patterning, respectively. We investigate the angular performance of the trench pattern and further demonstrate how such a cloaking strategy could be implemented in concentrator photovoltaics to enable efficiency peaks at concentrations beyond 1000 suns.

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