期刊
出版社
ELSEVIER SCIENCE INC
DOI: 10.1016/j.precisioneng.2022.06.004
关键词
Nanofabrication; Cold lithography; Nanotechnology; Single-molecule devices
类别
资金
- Office of Naval Research [N000141612741]
- U.S. Department of Defense (DOD) [N000141612741] Funding Source: U.S. Department of Defense (DOD)
This study describes a simple and efficient method for fabricating electrode nanogaps, using a single electron beam lithography step and continuous dose to achieve nanogap spacing from 5 to 40 nm. This approach offers high fidelity and universality, facilitating the study of nanoscale materials and effects.
The consistent motivation to observe molecular electronics and quantum effects drives the need for the tunable and robust fabrication of nanogap devices. Electron beam lithography (EBL) offers high fidelity fabrication to construct arrayed nanogaps, and methods have been developed to achieve sub-10 nm channel widths. However, many of these approaches involve multiple lithography steps or specialized techniques that limit throughput and universality. This work describes a simple, single EBL step, continuous dose, and direct feature write method of fabricating electrode pairs with nanogap spacing from 5 to 40 nm. This straightforward technique relies on precise electron beam focusing coupled with cold lithography for developing. Overall, this protocol enables efficient production of electrode nanogaps to facilitate the study of nanoscale materials and effects.
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