期刊
MICROELECTRONICS JOURNAL
卷 129, 期 -, 页码 -出版社
ELSEVIER SCI LTD
DOI: 10.1016/j.mejo.2022.105580
关键词
Power divider; Through-silicon via; Dual-band; Lumped element
资金
- Fok Ying Tung Education Foundation [171112]
- Shaanxi Innovation Capacity Support Project [2021TD-25]
- Shaanxi Provincial Education Department Youth Innovation Team Construction Research Program [21JP080]
- Fundamental Research Funds for the Central Universities [JB211110]
In this paper, a dual-frequency compact power divider based on silicon via (TSV) is proposed. The matrix analysis method is used to convert the microstrip structure into pi-type structure, improving the integration of the circuit. The simulated results show that the proposed power divider has good performance with two frequency points at 10 GHz and 20 GHz. Additionally, the size of the power divider is very small, making it suitable for compact circuit designs.
In this paper, a dual-frequency compact power divider based on silicon via (TSV) is proposed. The matrix analysis method is used to convert the microstrip structure into pi-type structure, which improves the integration of the circuit. The proposed dual-frequency power divider structure is simulated and verified with High Frequency Structure Simulator (HFSS). The results show that the two frequency points of the dual frequency power divider structure are 10 GHz and 20 GHz respectively. In the low frequency band, the input return loss, and isolation are all lower than-15dB from 6.5 to 14.6 GHz. Insertion loss is better than-3.1 dB. In the high band, input return loss and isolation are all below-15dB from 15.3 to 20.8 GHz. Insertion loss is better than-3.3 dB. In addition, the size of the dual frequency power divider is only 0.2 x 0.428 mm2(0.009 x 0.004 lambda g2).
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