Structural properties of sputter-deposited nanocrystalline Ni thin films

For this study, Ni thin films were deposited on a glass substrate by using 200, 300, and 400 W direct-current magnetron sputtering method for observing the effect of sputtering power on the structural properties of thin films. Grain size, crystallinity, orientation, and texture of the deposited thin films were observed and evaluated by X-ray diffraction (XRD) analysis. According to XRD analysis, all thin films presented crystalline atomic structure. Furthermore, the effect of texture on the structural properties were observed using strain analysis and grain sizes that were calculated by Scherrer's method and Williamson-Hall analysis. The analysis revealed that the grain size of sputter-deposited thin films increased linearly with respect to the increasing sputtering power. Additionally, the elastic modulus and indentation hardness of the samples were measured by nanoindentation method, and the results were evaluated in terms of grain size and texture. The highest grain size, 7.30 nm, was observed on a 400 W sputter-deposited sample, which also had the highest elastic modulus and indentation hardness values as 98 and 3.6 GPa, respectively.

Automated summary

In this study, Ni thin films were deposited on a glass substrate using different sputtering powers, and the effect of sputtering power on the structural properties of the films was investigated. X-ray diffraction analysis revealed that the grain size of the films increased linearly with increasing sputtering power. Nanoindentation measurements showed that the samples deposited at 400 W exhibited the highest grain size, elastic modulus, and indentation hardness.