4.6 Article

Kinetics driving nanocomposite thin-film deposition in low-pressure misty plasma processes

期刊

出版社

IOP Publishing Ltd
DOI: 10.1088/1361-6463/ac9ac2

关键词

nanocomposite; misty plasma; thin film; PECVD; colloidal solution

向作者/读者索取更多资源

Mist-assisted methods in plasma deposition of high-quality thin films have recently gained attention, but little is known about plasma interactions with misted colloidal solutions. Time-resolved optical diagnostics were used to study the deposition of TiO2-SiO2 nanocomposite thin films in low-pressure oxygen-argon plasmas. The presence of nanoparticles in misty plasma effects were dominated by plasma droplets, not plasma-nanoparticle interactions. Subsequent matrix-rich and nanoparticle-rich deposition steps were confirmed using in situ spectroscopic ellipsometry.
Mist-assisted methods have recently attracted much attention for plasma deposition in high-quality (multi)functional thin films. However, very little is known on plasma interactions with misted colloidal solutions and their role in plasma process kinetics. Time-resolved optical diagnostics have been carried out to study the deposition of TiO2-SiO2 nanocomposite thin films in low-pressure oxygen-argon plasmas with organosilicon precursors and TiO2 suspensions. Each pulsed injection of the dispersion was followed by a pressure rise due to solvent evaporation. This caused a significant reduction in the electron temperature and density, which mitigated matrix precursor fragmentation and SiO2 deposition as TiO2 nanoparticles were supplied to the film. Comparing injections with and without nanoparticles, misty plasma effects were dominated by plasma droplets rather than plasma-nanoparticle interactions. Successive matrix-rich and nanoparticle-rich deposition steps were confirmed by in situ spectroscopic ellipsometry.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.6
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据