Influence of Surface Roughness on the Dynamics and Crystallization of Vapor-Deposited Thin Films

The substrate roughness is a very important parameter that can influence the properties of supported thin films. In this work, we investigate the effect of surface roughness on the properties of a vapor-deposited glass (celecoxib, CXB) both in its bulk and in confined states. Using dielectric spectroscopy, we provide experimental evidence depicting a profound influence of surface roughness on the alpha-relaxation dynamics and the isothermal crystallization of this vapor-deposited glass. Besides, we have verified the influence of film confinement on varying values of surface roughnesses as well. At a fixed surface roughness value, the confinement could alter both the dynamics and crystallization of vapor-deposited CXB.

Automated summary

In this study, the influence of surface roughness on the properties of vapor-deposited glass and the effect of film confinement on changing surface roughness values were investigated using dielectric spectroscopy.