4.7 Article

Longitudinal and latitudinal split-gate field-effect transistors for NAND and NOR logic circuit applications

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NATURE PORTFOLIO
DOI: 10.1038/s41699-022-00320-w

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  1. National Research Foundation of Korea (NRF) [NRF-2021R1C1C1005235]
  2. Korea Institute of Science and Technology (KIST) Institution Program [2E31532]

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In this paper, two different homogeneous MoS2-based SG-FET structures, AND-FET and OR-FET, are proposed, and NAND and NOR logic gates are successfully demonstrated using these structures. These approaches are expected to enable multi-functionality and high integration in future electronic devices based on 2D materials.
Two-dimensional (2D) materials have been extensively adopted in various device architectures for advanced applications owing to their structural diversity, high functionality, and ease of integration. Among the various architectures, split-gate field-effect transistors (SG-FETs) have been widely studied based on their sequentially located SG electrode along the source/drain electrodes. In this paper, we propose two different homogeneous molybdenum disulfide (MoS2)-based SG-FET structures, namely AND-FET and OR-FET, whose gap directions are perpendicular to each other. It can exhibit AND or OR switching characteristics if it has a longitudinal or latitudinal gapped SG structure, respectively. Moreover, the AND-FET and OR-FET are regarded as folded structures of series and parallel connections of two n-type transistors. By using these switching devices, we successfully demonstrate NAND and NOR logic gates through a single active channel. These approaches are expected to pave the way for the realization of multi-functionality and high integration of 2D material-based future electronic devices.

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