4.7 Article

Reduced material loss in thin-film lithium niobate waveguides

期刊

APL PHOTONICS
卷 7, 期 8, 页码 -

出版社

AIP Publishing
DOI: 10.1063/5.0095146

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资金

  1. Air Force Office of Scientific Research [FA9550-19-1-0376]
  2. Swiss National Science Foundation (SNSF) [185870, 192293]
  3. Defense Advanced Research Projects Agency [HR0011-20-C-0137, HR0011-20-2-0046]

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Thin-film lithium niobate has the potential for various scalable applications, but improving optical losses is crucial for high-performance classical and quantum devices.
Thin-film lithium niobate has shown promise for scalable applications ranging from single-photon sources to high-bandwidth data communication systems. Realization of the next generation high-performance classical and quantum devices, however, requires much lower optical losses than the current state of the art resonator (Q-factor of similar to 10 x 10(6)million). Yet the material limitations of ion-sliced thin film lithium niobate have not been explored; therefore, it is unclear how high the quality factor can be achieved in this platform. Here, using our newly developed characterization method, we find out that the material limited quality factor of thin film lithium niobate photonic platform can be improved using post-fabrication annealing and can be as high as Q approximate to 1.6 x 10(8) at telecommunication wavelengths, corresponding to a propagation loss of 0.2 dB/m. (C) 2022 Author(s).

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