期刊
JOURNAL OF CRYSTAL GROWTH
卷 436, 期 -, 页码 150-154出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.jcrysgro.2015.12.013
关键词
Crystal structure; Chemical vapor deposition processes; Oxides; Semiconducting ternary compounds
资金
- Japan Society for the Promotion of Science (JSPS) [25286050]
- Grants-in-Aid for Scientific Research [25286050] Funding Source: KAKEN
We report improved growth conditions for corundum-structured alpha-(AlxGa1-x)(2)O-3, followed by the growth characteristics of alpha-(AlxGa1-x)(2)O-3/Ga2O3 heterostructures with the use of mist chemical vapor deposition (CVD) technology. Higher growth temperatures, 700-800 degrees C, were effective for better crystalline quality especially for higher Al composition chi. Coherent growth of alpha-(AlxGa1-x)(2)O-3 was achieved for x=0.03 and 0.11 with the film thickness of about 100 nm. The type-I band lineup was expected for the heterostructure. (C) 2015 Elsevier B.V. All rights reserved.
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