期刊
JOURNAL OF CRYSTAL GROWTH
卷 439, 期 -, 页码 28-32出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.jcrysgro.2015.12.051
关键词
Low dimensional structures; Nanostructures; Single crystal growth; Chemical vapor deposition processes; Nitrides
资金
- NTU-A*Star Silicon Technologies, Centre of Excellence [1123510003]
- National Research Fundation of Singapore [NRF-CRP12-2013-04]
We report the use of Germanium (Ge) as catalyst for Gallium Nitride (GaN) nanowires growth. High-yield growth has been achieved with Ge nanoparticles obtained by dewetting a thin layer of Ge on a Si (100) substrate. The nanowires are long and grow straight with very little curvature. The GaN nanowires are single-crystalline and show a Wurtzite structure growing along the [0001] axis. The growth follows a metal-free Vapor-Liquid-Solid (VLS) mechanism, further allowing a CMOS technology compatibility. The synthesis of nanowires has been done using an industrial Low Pressure Chemical Vapor Deposition (LPCVD) system. (C) 2016 Elsevier B.V. All rights reserved.
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