Time-of-flight mass spectrometry diagnostics in deep oscillation magnetron sputtering (DOMS) of titanium

Reflectron-type time-of-flight mass spectrometry was applied to the time-resolved component analysis of deep oscillation magnetron sputtering (DOMS), which has been developed as a technique of modulated pulsed magnetron sputtering. In the present study, the DOMS of a Ti target was performed under an Ar gas atmosphere by using a DOMS-specific control waveform consisting of 25 current and/or power pulses. The time evolution of the formation of ionized species (Ar+, Ar2+, Ti+, and Ti2+) after the application of the first discharge pulse was observed at the position corresponding to the deposition region. This study revealed that the plasma build-up process from non-metallic plasma to metallic plasma takes approximately two micropulses (around 100 mu s from ignition) in DOMS discharge. In addition, we have found the possibility of studying sputtering processes, such as the rarefaction, and refilling processes of Ar as a function of pulse number through DOMS research. Published under an exclusive license by AIP Publishing. Published under an exclusive license by AIP Publishing.

Automated summary

The study used reflexron-type time-of-flight mass spectrometry to analyze deep oscillation magnetron sputtering (DOMS) and revealed the plasma build-up process from non-metallic plasma to metallic plasma, as well as the rarefaction and refilling processes of Ar.