Synthesis chemical methods for deposition of ZnO, CdO and CdZnO thin films to facilitate further research

Thin film materials have been used in semiconductor devices, wireless communications, telecommunica-tions, integrated circuits, rectifiers, transistors, solar cells, lightemitting diodes, photoconductors and light crystal displays, lithography, micro-electromechanical systems (MEMS) and multifunctional emerging coatings, as well as other emerging cutting technologies. The ZnO, CdO and CdZnO thin films were de-posited by chemical routes such as chemical bath deposition, spray pyrolysis, Sol-Gel spin coating, elec-trodeposition, SILAR, chemical vapour deposition, atomic layer deposition, and pulsed vapour deposition are discussed. Furthermore, the ZnO, CdO and CdZnO thin films depend on various preparative parameters such as the molarity, pH of the solution, deposition time, annealing temperature, annealing time, thickness, substrate used and pressure etc are also discussed.(c) 2022 Elsevier B.V. All rights reserved.

Automated summary

This review discusses the applications of thin film materials in various fields and explores the advantages and disadvantages of different chemical deposition methods. The influence of preparative parameters on the properties of thin films is also discussed.