4.7 Article

Photon management by scratch-resistant antireflection coating for the efficiency enhancement of silicon solar cell

期刊

INTERNATIONAL JOURNAL OF ENERGY RESEARCH
卷 46, 期 11, 页码 15485-15498

出版社

WILEY
DOI: 10.1002/er.8247

关键词

hydrophobic coating; multilayer antireflection coating (ARC); refractive index; scratch resistant ARC; silicon photovoltaic system

资金

  1. Cochin University of Science and Technology

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An antireflection coating with mechanical robustness has been developed using the spin coating technique. This coating demonstrates high transparency, scratch resistance, light-trapping ability, and self-cleaning ability, while maintaining stability under UV-B radiation. It offers a promising approach for improving the efficiency and reliability of solar and optical applications.
Antireflection coating (ARC) plays a crucial role in many solar and optical applications. ARC with mechanical robustness was developed to achieve more efficiency for the photovoltaic system cover glasses, by depositing porous Vinyltriethoxysilane/Pluronic F-127-based coating via spin coating technique. The coating shows maximum transparency around 93% in the visible region (400-800 nm). The mechanical robustness of the coating was analyzed using a pencil scratch test as per the ASTM standard D 3363-05 and it showed good stability against a 9H hardness pencil. The porous coating exhibited an enhanced conversion efficiency of 10.56% as compared to the bare glass of efficiency 9.71%; which validate the light-trapping ability of the coating in the visible region. Also, the coating sustains the efficiency of the solar cell even during dust exposure due to its good self-cleaning ability with water contact angle of 112 degrees. It is also noteworthy that the prepared ARC shows UV stability under the UV-B lamp for 72 hours. The ARC developed in this study opens a promising approach to harvest renewable solar energy for photovoltaic systems.

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