4.5 Article

Interaction between Graphene Nanoribbon and an Array of QDs: Introducing Nano Grating

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PHOTONICS
卷 9, 期 5, 页码 -

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MDPI
DOI: 10.3390/photonics9050348

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total susceptibility; graphene nanoribbon; quantum dot; surface plasmon; bipolar interaction

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In this study, the interaction between a quantum dot array and a graphene nanoribbon is investigated using dipole-dipole interaction. The researchers find that by changing the size, number, and type of quantum dots as well as their arrangement, the optical properties can be controlled. This has various applications in optical integrated circuits.
In this work, the interaction between an array of QDs and Graphene nanoribbon is modeled using dipole-dipole interaction. Then, based on the presented model, we study the linear optical properties of the considered system and find that by changing the size, number, and type of quantum dots as well as how they are arranged, the optical properties can be controlled and the controllable grating plasmonic waveguides can be implemented. Therefore, we introduce different structures, compare them together and find that each of them can be useful based on their application in optical integrated circuits. The quantum dot arrays are located on a graphene nanoribbon with dimensions of 775 x 40 nm(2). Applying electromagnetic waves with a wavelength of 1.55 mu m causes polarization in the quantum dots and induces surface polarization on graphene. It is shown that, considering the large radius of the quantum dot, the induced polarization is increased, and ultimately the interaction with other quantum dots and graphene nanoribbon is stronger. Similarly, the distance between quantum dots and the number of QDs on Graphene nanoribbon are basic factors that affect the interaction between QDs and nanoribbon. Due to the polarization effect of these elements between each other, we see the creation of the effective grating refractive index in the plasmonic waveguide. This has many applications in quantum optical integrated circuits, nano-scale atomic lithography for nano-scale production, the adjustment coupling coefficient between waveguides, and the implementation of optical gates, reflectors, detectors, modulators, and others.

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