4.7 Article

In-situ anisotropic growth of nickel oxide nanostructures through layer-by-layer metal oxidation

期刊

SCRIPTA MATERIALIA
卷 214, 期 -, 页码 -

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PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.scriptamat.2022.114660

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Oxidation; Crystal growth; In-situ transmission electron microscopy; Interfaces

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This study reports the one-directional growth of single crystalline nickel oxide nanostructures that is facilitated by the oxidation of nickel nanoparticles. By in-situ high resolution transmission electron microscopy, layer-by-layer growth at the buried NiO/Ni interface was directly observed. The results demonstrate the applicability of the terrace-ledge-kink crystal growth model for reactive crystal growth processes at internal heterophase interfaces.
This study reports the one-directional growth of single crystalline nickel oxide nanostructures that is facilitated by the oxidation of nickel nanoparticles. Layer-by-layer growth at the buried NiO/Ni interface was directly observed by in-situ high resolution transmission electron microscopy at 650 degrees C in an oxygen partial pressure around 4 x 10(-4) Pa. Individual layers of NiO grow by ledge movement, i.e., disconnection migration along the oxide/metal interface plane. Oxidation at interfacial steps is governed by oxygen vacancy migration along the interface plane, while the junction between the oxide/metal interface and the gas phase serves as nucleation site. The results of this study demonstrate the applicability of the terrace-ledge-kink crystal growth model for reactive crystal growth processes at internal heterophase interfaces.

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