4.7 Article

Linking through-thickness cracks in metallic thin films to in-situ electrical resistance peak broadening

期刊

SCRIPTA MATERIALIA
卷 212, 期 -, 页码 -

出版社

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.scriptamat.2022.114550

关键词

Nanocrystalline metal; Thin films; Fatigue; Electrical resistivity; Through-thickness cracks

资金

  1. Austrian Science Fund (FWF) [I 4384-N]
  2. German Research Foundation (DFG) [ME-4368/8]

向作者/读者索取更多资源

Measurements of electrical resistance have been commonly used as a failure criterion for cyclically loaded conductive films. However, there is limited research on extracting additional information from resistance data sets. This study demonstrates that an increased peak width indicates a transition from cracks bridging to through-thickness crack formation. The method is applicable to various material systems and offers a time-efficient and non-destructive alternative to traditional inspection methods.
Measurements of electrical resistance have been used extensively as a failure criterion in cyclically loaded conductive films. However, not much research has been performed on extracting additional information contained within such resistance data sets. This study shows that an increase in peak width evidences a transition from cracks bridging to through-thickness crack formation. A Au/Cr bilayer system on a polyimide substrate is used for data generation but the method is applicable to any material system where both necking and through-thickness cracks are formed and no immediate formation of electrically insulating oxide layers occurs upon damage initiation. The method is easy to implement, and has the ability to replace time-intensive and destructive inspection methods.(c) 2022 The Authors. Published by Elsevier Ltd on behalf of Acta Materialia Inc. This is an open access article under the CC BY license ( http://creativecommons.org/licenses/by/4.0/ )

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