4.7 Article

Phase tailoring of Ta films via buffer layer-thicknesses controlling

期刊

SCRIPTA MATERIALIA
卷 212, 期 -, 页码 -

出版社

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.scriptamat.2022.114582

关键词

Nanocrystalline metal; Heterostructures; Nucleation of phase transformations; Epitaxial growth; Size effect

资金

  1. National Natural Science Foundation of China [U2067219, U20B2027, 52001247, 92163201]
  2. 111 Project of China [BP2018008]
  3. International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technologies

向作者/读者索取更多资源

In this study, a templated growth strategy by introducing a Cr buffer layer is proposed to tailor the phase composition in Ta films. The beta-Ta/alpha-Ta ratio in the films can be continuously and precisely controlled by adjusting the thickness of the buffer layer, resulting in different hardness of the Ta films.
Hard beta-Ta phase is generally produced during Ta film deposition. While in some cases, soft alpha-Ta phase is preferred to ensure deformation capability. In this work, templated growth strategy by introducing Cr buffer layer is proposed to tailor the phase composition in Ta films. A broad spectrum of beta-Ta/alpha-Ta ratio from 90% to 0% can be continuously and precisely achieved when the buffer layer thickness is correspondingly controlled from 0 to similar to 90 nm. Hardness of the Ta films is well proportional to the beta-Ta/alpha-Ta ratio. The underlying mechanism of phase tailoring is rationalized by demonstrating the thickness-dependent crystallization of buffer layer.

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